مؤتمر
The Setting of Linewidth Reference on Photomasks through Physical Process Modeling
العنوان: | The Setting of Linewidth Reference on Photomasks through Physical Process Modeling |
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المؤلفون: | Hu, Rui, Wu, Qiang |
المصدر: | 2021 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2021 China. :1-4 Mar, 2021 |
Relation: | 2021 China Semiconductor Technology International Conference (CSTIC) |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 9781665449458 9781665449441 |
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DOI: | 10.1109/CSTIC52283.2021.9461528 |