The Setting of Linewidth Reference on Photomasks through Physical Process Modeling

التفاصيل البيبلوغرافية
العنوان: The Setting of Linewidth Reference on Photomasks through Physical Process Modeling
المؤلفون: Hu, Rui, Wu, Qiang
المصدر: 2021 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2021 China. :1-4 Mar, 2021
Relation: 2021 China Semiconductor Technology International Conference (CSTIC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781665449458
9781665449441
DOI:10.1109/CSTIC52283.2021.9461528