Development status of gate-first FeFET technology

التفاصيل البيبلوغرافية
العنوان: Development status of gate-first FeFET technology
المؤلفون: Muller, S., Zhou, H., Benoist, A., Ocker, J., Noack, M., Kuzmanov, G., Iqbal, R., Le Minh, D., Ghazaryan, M., Anjaneyamoorthi, V., Daraghmah, A., Mennenga, M., Koushan, F., Tassan, F., Dunkel, S., Muller, J., Beyer, S., Soss, S., Pourkeramati, A.
المصدر: 2021 Symposium on VLSI Technology VLSI Technology, 2021 Symposium on. :1-2 Jun, 2021
Relation: 2021 Symposium on VLSI Technology
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781665419451
تدمد:21589682