مؤتمر
Plasma-induced roughness and chemical modifications of TiN bottom electrode and their impact on HfO2-MIM properties
| العنوان: | Plasma-induced roughness and chemical modifications of TiN bottom electrode and their impact on HfO2-MIM properties |
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| المؤلفون: | Rogalskyj, Sophia, Frost, Hunter, Palka, Amber, Joy, Nicholas, Triyoso, Dina, Clark, Robert, Wajda, Cory, Leusink, Gert, Raley, Angelique, Dunn, Kathleen |
| المصدر: | 2020 IEEE International Interconnect Technology Conference (IITC) Interconnect Technology Conference (IITC),2020 IEEE International. :49-51 Oct, 2020 |
| Relation: | 2020 IEEE International Interconnect Technology Conference (IITC) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781728161136 9781728161129 |
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| تدمد: | 23806338 |
| DOI: | 10.1109/IITC47697.2020.9515603 |