دورية أكاديمية
Low-Energy Plasma Source for Clean Vacuum Environments: EUV Lithography and Optical Mirrors Cleaning
| العنوان: | Low-Energy Plasma Source for Clean Vacuum Environments: EUV Lithography and Optical Mirrors Cleaning |
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| المؤلفون: | van Veldhoven, J., Stodolna, A.S., Storm, A., van den Brink, J., Geerits, N., Vlaar, J., Dekker, M., Ushakov, A. |
| المصدر: | IEEE Transactions on Plasma Science IEEE Trans. Plasma Sci. Plasma Science, IEEE Transactions on. 49(10):3132-3141 Oct, 2021 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | تدمد: | 00933813 19399375 |
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| DOI: | 10.1109/TPS.2021.3110423 |