Study on thermal stability of all copper interconnect structures under thermal shock

التفاصيل البيبلوغرافية
العنوان: Study on thermal stability of all copper interconnect structures under thermal shock
المؤلفون: Li, Hao, Shen, Jun, Xie, Jiacheng
المصدر: 2021 22nd International Conference on Electronic Packaging Technology (ICEPT) Electronic Packaging Technology (ICEPT), 2021 22nd International Conference on. :1-5 Sep, 2021
Relation: 2021 22nd International Conference on Electronic Packaging Technology (ICEPT)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781665413916
DOI:10.1109/ICEPT52650.2021.9568106