التفاصيل البيبلوغرافية
| العنوان: |
Development and Characterization of High Temperature Plasma Nitridation Process for Advanced CMOS Technology Application |
| المؤلفون: |
Kang, Xiaoxu, Zhong, Xiaolan, Chen, Zhangfa, Dao, Zhengkai, Zhang, Qiang, Wan, Hao, Zhou, Yamin, Li, Ming, Guo, Yingjia, Nie, Ran, Wu, Tao |
| المصدر: |
2021 IEEE 14th International Conference on ASIC (ASICON) ASIC (ASICON), 2021 IEEE 14th International Conference on. :1-3 Oct, 2021 |
| Relation: |
2021 IEEE 14th International Conference on ASIC (ASICON) |
| قاعدة البيانات: |
IEEE Xplore Digital Library |
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