مؤتمر
Silicide-related yield enhancement in a deep submicrometer CMOS process
العنوان: | Silicide-related yield enhancement in a deep submicrometer CMOS process |
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المؤلفون: | Qian, S., Solis, R., Haley, M., Pesnell, G., Mitchell, T., Butler, R., Ziger, D., Klatt, J., Delgado, M., Karnett, M.P., Davis, J. |
المصدر: | 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) Semiconductor manufacturing Semiconductor Manufacturing Symposium, 2001 IEEE International. :287-290 2001 |
Relation: | 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 0780367316 9780780367319 |
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DOI: | 10.1109/ISSM.2001.962969 |