Silicide-related yield enhancement in a deep submicrometer CMOS process

التفاصيل البيبلوغرافية
العنوان: Silicide-related yield enhancement in a deep submicrometer CMOS process
المؤلفون: Qian, S., Solis, R., Haley, M., Pesnell, G., Mitchell, T., Butler, R., Ziger, D., Klatt, J., Delgado, M., Karnett, M.P., Davis, J.
المصدر: 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) Semiconductor manufacturing Semiconductor Manufacturing Symposium, 2001 IEEE International. :287-290 2001
Relation: 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings
قاعدة البيانات: IEEE Xplore Digital Library