High Breakdown Voltage AlGaN/GaN HEMT with Graded Fluorine Ion Implantation Terminal in Thick Passivation Layer

التفاصيل البيبلوغرافية
العنوان: High Breakdown Voltage AlGaN/GaN HEMT with Graded Fluorine Ion Implantation Terminal in Thick Passivation Layer
المؤلفون: Deng, Siyu, Luo, Xiaorong, Wei, Jie, Jia, Yanjiang, Sun, Tao, Xi, Lufan, Jiang, Zhuolin, Yang, Kemeng, Jiang, Qingfeng, Zhang, Bo
المصدر: 2021 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia) Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia), 2021 IEEE Workshop on. :403-406 Aug, 2021
Relation: 2021 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781665418515
9781665418508
DOI:10.1109/WiPDAAsia51810.2021.9656064