مؤتمر
Infrared interface analysis of high-k dielectrics deposited by atomic layer chemical vapour deposition
| العنوان: | Infrared interface analysis of high-k dielectrics deposited by atomic layer chemical vapour deposition |
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| المؤلفون: | Cosnier, V., Bender, H., Caymax, A., Chen, J., Conard, T., Nohira, H., Richard, O., Tsai, W., Vandervorst, W., Young, E., Zhao, C., De Gendt, S., Heyns, A., Maes, J.W.H., Tuominen, M., Rochat, N., Olivier, M., Chabli, A. |
| المصدر: | Extended Abstracts of International Workshop on Gate Insulator. IWGI 2001 (IEEE Cat. No.01EX537) Gate insulator Gate Insulator, 2001. IWGI 2001. Extended Abstracts of International Workshop on. :226-229 2001 |
| Relation: | Extended Abstracts of International Workshop on Gate Insulator. IWGI 2001 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 4891140216 9784891140212 |
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| DOI: | 10.1109/IWGI.2001.967590 |