مؤتمر
A Study of the Advantages to the Photolithography Process brought by the High NA EUV Exposure Tool in Advanced Logic Design Rules
| العنوان: | A Study of the Advantages to the Photolithography Process brought by the High NA EUV Exposure Tool in Advanced Logic Design Rules |
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| المؤلفون: | Li, Y., Zhu, X., Yu, S., Wu, Q. |
| المصدر: | 2021 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2021 International Workshop on. :1-4 Dec, 2021 |
| Relation: | 2021 International Workshop on Advanced Patterning Solutions (IWAPS) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
| ردمك: | 9781665420792 |
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| DOI: | 10.1109/IWAPS54037.2021.9709626 |