دورية أكاديمية
Novel Dual Liner Process for Side-Shielded Forksheet Device With Superior Design Margin
| العنوان: | Novel Dual Liner Process for Side-Shielded Forksheet Device With Superior Design Margin |
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| المؤلفون: | Kim, M., Lee, K., Kim, S., Lee, J., Park, B., Kwon, D. |
| المصدر: | IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 69(5):2232-2235 May, 2022 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | تدمد: | 00189383 15579646 |
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| DOI: | 10.1109/TED.2022.3156957 |