التفاصيل البيبلوغرافية
| العنوان: |
Reliability of Ferroelectric and Antiferroelectric Si:HfO2 materials in 3D capacitors by TDDB studies |
| المؤلفون: |
Viegas, A., Falidas, K., Ali, T., Kuhnel, K., Hoffmann, R., Mart, C., Czernohorsky, M., Heitmann, J. |
| المصدر: |
2022 IEEE International Reliability Physics Symposium (IRPS) Reliability Physics Symposium (IRPS), 2022 IEEE International. :P47-1-P47-5 Mar, 2022 |
| Relation: |
2022 IEEE International Reliability Physics Symposium (IRPS) |
| قاعدة البيانات: |
IEEE Xplore Digital Library |
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