Study of Plasma Ash Rate Enhancement by Machine Learning Models for TAT Improvement

التفاصيل البيبلوغرافية
العنوان:	Study of Plasma Ash Rate Enhancement by Machine Learning Models for TAT Improvement
المؤلفون:	Jheng, Shao-Lou, Wu, Jyunhong, Yang, Zusing, Chiu, Yuan-Chieh, Wu, Ming-Tsung, Lee, Hong-Ji, Lian, Nan-Tzu, Yang, Tahone, Chen, Kuang-Chao, Lu, Chih-Yuan
المصدر:	2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) Advanced Semiconductor Manufacturing Conference (ASMC), 2021 32nd Annual SEMI. :1-4 May, 2021
Relation:	2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
قاعدة البيانات:	IEEE Xplore Digital Library