In-situ Cleaning of Post-etch Byproducts by Manipulating Dechucking Environment Gas in Silicon Etch Process

التفاصيل البيبلوغرافية
العنوان:	In-situ Cleaning of Post-etch Byproducts by Manipulating Dechucking Environment Gas in Silicon Etch Process
المؤلفون:	Yang, Ki Dong, Park, Hanbit, Lee, Joonho H., Hwang, Eunji, Jeong, Jiwoo, Kwon, Sangku, Kim, Kihyun, Jeong, Jaein, Han, Eunyoung, Kim, Young Jeong, Kim, Joong Jung
المصدر:	2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2022 33rd Annual. :1-4 May, 2022
Relation:	2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
قاعدة البيانات:	IEEE Xplore Digital Library