دورية أكاديمية

Keeping Deep Lithography Simulators Updated: Global–Local Shape-Based Novelty Detection and Active Learning

التفاصيل البيبلوغرافية
العنوان: Keeping Deep Lithography Simulators Updated: Global–Local Shape-Based Novelty Detection and Active Learning
المؤلفون: Shao, H., Ping, H., Chen, K., Su, W., Lin, C., Fang, S., Tsai, P., Liu, Y.
المصدر: IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst. Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on. 42(3):1000-1014 Mar, 2023
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
تدمد:02780070
19374151
DOI:10.1109/TCAD.2022.3192175