مؤتمر
Analysis of Influence to Gate Stack of Eeprom Using CL Doped Re-Oxidation
| العنوان: | Analysis of Influence to Gate Stack of Eeprom Using CL Doped Re-Oxidation |
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| المؤلفون: | Zhang, Hong, Huang, Po-Yu |
| المصدر: | 2022 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2022 China. :1-4 Jun, 2022 |
| Relation: | 2022 China Semiconductor Technology International Conference (CSTIC) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
| ردمك: | 9781665497589 9781665497572 |
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| DOI: | 10.1109/CSTIC55103.2022.9856918 |