Advanced TCAD Simulation of Tunnel Oxide Degradation for EEPROM Applications

التفاصيل البيبلوغرافية
العنوان: Advanced TCAD Simulation of Tunnel Oxide Degradation for EEPROM Applications
المؤلفون: Matteo, F., Simola, R., Postel-Pellerin, J., Coulie, K.
المصدر: 2022 IEEE 4th International Conference on Dielectrics (ICD) Dielectrics (ICD), 2022 IEEE 4th International Conference on. :764-768 Jul, 2022
Relation: 2022 IEEE 4th International Conference on Dielectrics (ICD)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781665418331
DOI:10.1109/ICD53806.2022.9863611