مؤتمر
Hot-wall batch-type CVD tool for high-k (Ba,Sr)TiO/sub 3/ capacitors
| العنوان: | Hot-wall batch-type CVD tool for high-k (Ba,Sr)TiO/sub 3/ capacitors |
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| المؤلفون: | Kiyotoshi, M., Yamazaki, S., Nakahira, J., Eguchi, K., Hieda, K., Yamamoto, H., Umehara, T., Hasebe, K., Asano, T., Nakao, K., Arikado, T., Okumura, K. |
| المصدر: | Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) Semiconductor manufacturing Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on. :110-113 2000 |
| Relation: | Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780373928 9780780373921 |
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| تدمد: | 1523553X |
| DOI: | 10.1109/ISSM.2000.993628 |