مؤتمر
Advanced wet cleaning using novel nozzle and functional ultrapure water in next generation FPD/LSI manufacturing
| العنوان: | Advanced wet cleaning using novel nozzle and functional ultrapure water in next generation FPD/LSI manufacturing |
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| المؤلفون: | Mitsumori, K., Nobuaki, H., Takahashi, N., Imaoka, T., Ohmi, T. |
| المصدر: | Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) Semiconductor manufacturing Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on. :329-332 2000 |
| Relation: | Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780373928 9780780373921 |
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| تدمد: | 1523553X |
| DOI: | 10.1109/ISSM.2000.993680 |