دورية أكاديمية
Understanding the Effect of Oxygen Content on Ferroelectric Properties of Al-Doped HfO Thin Films
العنوان: | Understanding the Effect of Oxygen Content on Ferroelectric Properties of Al-Doped HfO Thin Films |
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المؤلفون: | Li, Z., Wang, T., Liu, Y., Yu, J., Meng, J., Liu, P., Xu, K., Zhu, H., Sun, Q., Zhang, D.W., Chen, L. |
المصدر: | IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 44(1):56-59 Jan, 2023 |
قاعدة البيانات: | IEEE Xplore Digital Library |
تدمد: | 07413106 15580563 |
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DOI: | 10.1109/LED.2022.3226195 |