دورية أكاديمية
Colossal laser ablation threshold of Ge crystal due to formation of GeO2 nanolayer: “Lid Effect” - Subsurface boiling mechanism
| العنوان: | Colossal laser ablation threshold of Ge crystal due to formation of GeO2 nanolayer: “Lid Effect” - Subsurface boiling mechanism |
|---|---|
| المؤلفون: | Medvids, A., Kaupužs, J., Onufrijevs, P., Grase, L., Zukuls, A. |
| المصدر: | In Optics and Laser Technology November 2019 119 |
| قاعدة البيانات: | ScienceDirect |
Full Text Finder | تدمد: | 00303992 |
|---|---|
| DOI: | 10.1016/j.optlastec.2019.105630 |