دورية أكاديمية
Post-deposition annealing challenges for ALD Al0.5Si0.5Ox/n-GaN MOS devices
| العنوان: | Post-deposition annealing challenges for ALD Al0.5Si0.5Ox/n-GaN MOS devices |
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| المؤلفون: | Fernandes Paes Pinto Rocha, P., Vauche, L., Bedjaoui, M., Cadot, S., Mohamad, B., Vandendaele, W., Martinez, E., Gauthier, N., Pierre, F., Grampeix, H., Lefèvre, G., Salem, B., Sousa, V. |
| المصدر: | In Solid State Electronics November 2023 209 |
| قاعدة البيانات: | ScienceDirect |
Full Text Finder | تدمد: | 00381101 |
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| DOI: | 10.1016/j.sse.2023.108780 |