دورية أكاديمية

The correlation between mechanical stress, thermal shift and refractive index in HfO 2, Nb 2O 5, Ta 2O 5 and SiO 2 layers and its relation to the layer porosity

التفاصيل البيبلوغرافية
العنوان: The correlation between mechanical stress, thermal shift and refractive index in HfO 2, Nb 2O 5, Ta 2O 5 and SiO 2 layers and its relation to the layer porosity
المؤلفون: Stenzel, O., Wilbrandt, S., Kaiser, N., Vinnichenko, M., Munnik, F., Kolitsch, A., Chuvilin, A., Kaiser, U., Ebert, J., Jakobs, S., Kaless, A., Wüthrich, S., Treichel, O., Wunderlich, B., Bitzer, M., Grössl, M.
المصدر: In Thin Solid Films 2009 517(21):6058-6068
قاعدة البيانات: ScienceDirect
الوصف
تدمد:00406090
DOI:10.1016/j.tsf.2009.05.009