دورية أكاديمية
Improved electrical and reliability performance of 65 nm interconnects with new barrier integration schemes
| العنوان: | Improved electrical and reliability performance of 65 nm interconnects with new barrier integration schemes |
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| المؤلفون: | Delsol, R., Jacquemin, J.-P., Gregoire, M., Girault, V., Federspiel, X., Bouyssou, R.-X., Vannier, P., Normandon, P. |
| المصدر: | In Microelectronic Engineering 2006 83(11):2377-2380 |
| قاعدة البيانات: | ScienceDirect |
Full Text Finder | تدمد: | 01679317 |
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| DOI: | 10.1016/j.mee.2006.10.040 |