دورية أكاديمية
Improved Ti germanosilicidation by Ge pre-amorphization implantation (PAI) for advanced contact technologies
| العنوان: | Improved Ti germanosilicidation by Ge pre-amorphization implantation (PAI) for advanced contact technologies |
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| المؤلفون: | Mao, Shujuan, Wang, Guilei, Xu, Jing, Zhang, Dan, Luo, Xue, Wang, Wenwu, Chen, Dapeng, Li, Junfeng, Du, Anyan, Zhao, Chao, Ye, Tianchun, Luo, Jun |
| المصدر: | In Microelectronic Engineering 5 December 2018 201:1-5 |
| قاعدة البيانات: | ScienceDirect |
Full Text Finder | تدمد: | 01679317 |
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| DOI: | 10.1016/j.mee.2018.09.006 |