دورية أكاديمية
Nucleation engineering for atomic layer deposition of uniform sub-10 nm high-K dielectrics on MoTe2
| العنوان: | Nucleation engineering for atomic layer deposition of uniform sub-10 nm high-K dielectrics on MoTe2 |
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| المؤلفون: | Lin, Yu-Shu, Kwak, Iljo, Chung, Tsai-Fu, Yang, Jer-Ren, Kummel, Andrew C., Chen, Miin-Jang |
| المصدر: | In Applied Surface Science 30 October 2019 492:239-244 |
| قاعدة البيانات: | ScienceDirect |
Full Text Finder | تدمد: | 01694332 |
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| DOI: | 10.1016/j.apsusc.2019.06.192 |