دورية أكاديمية
Optimization strategy for epoxy cross-linked molecular glass photoresist in EUV lithography
| العنوان: | Optimization strategy for epoxy cross-linked molecular glass photoresist in EUV lithography |
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| المؤلفون: | Gao, Jiaxing, Zhang, Siliang, Cui, Xuewen, Cong, Xue, Guo, Xudong, Hu, Rui, Wang, Shuangqing, Chen, Jinping, Li, Yi, Tian, Peng, Vockenhuber, Michaela, Kazazis, Dimitrios, Ekinci, Yasin, Yang, Guoqiang |
| المصدر: | In Journal of Photochemistry & Photobiology, A: Chemistry 1 August 2024 453 |
| قاعدة البيانات: | ScienceDirect |
Full Text Finder | تدمد: | 10106030 |
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| DOI: | 10.1016/j.jphotochem.2024.115684 |