دورية أكاديمية

Influences of lattice strain and SiGe buffer layer thickness on electrical characteristics of strained Si/SiGe/Si(110) heterostructures

التفاصيل البيبلوغرافية
العنوان: Influences of lattice strain and SiGe buffer layer thickness on electrical characteristics of strained Si/SiGe/Si(110) heterostructures
المؤلفون: Fujisawa, Taisuke, Onogawa, Atsushi, Horiuchi, Miki, Sano, Yuichi, Sakata, Chihiro, Yamanaka, Junji, Hara, Kosuke O., Sawano, Kentarou, Nakagawa, Kiyokazu, Arimoto, Keisuke
المصدر: In Materials Science in Semiconductor Processing July 2023 161
قاعدة البيانات: ScienceDirect
الوصف
تدمد:13698001
DOI:10.1016/j.mssp.2023.107476