دورية أكاديمية
Dielectric properties of hafnium oxide film prepared by HiPIMS at different O2/Ar ratios and their influences on TFT performance
| العنوان: | Dielectric properties of hafnium oxide film prepared by HiPIMS at different O2/Ar ratios and their influences on TFT performance |
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| المؤلفون: | Zhao, Ming-Jie, Wang, Yao-Tian, Yan, Jia-Hao, Li, Hai-Cheng, Xu, Hua, Wuu, Dong-Sing, Wu, Wan-Yu, Lai, Feng-Min, Lien, Shui-Yang, Zhu, Wen-Zhang |
| المصدر: | In Journal of Science: Advanced Materials and Devices June 2024 9(2) |
| قاعدة البيانات: | ScienceDirect |
Full Text Finder | تدمد: | 24682179 |
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| DOI: | 10.1016/j.jsamd.2024.100722 |