تقرير
Characterization of Si (sub X)Ge (sub 1-x)/Si Heterostructures for Device Applications Using Spectroscopic Ellipsometry
| العنوان: | Characterization of Si (sub X)Ge (sub 1-x)/Si Heterostructures for Device Applications Using Spectroscopic Ellipsometry |
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| المؤلفون: | Sieg, R. M, Alterovitz, S. A, Croke, E. T, Harrell, M. J, Tanner, M, Wang, K. L, Mena, R. A, Young, P. G |
| بيانات النشر: | United States: NASA Center for Aerospace Information (CASI), 1993. |
| سنة النشر: | 1993 |
| مصطلحات موضوعية: | Electronics And Electrical Engineering, Instrumentation And Photography |
| الوصف: | Spectroscopic ellipsometry (SE) characterization of several complex Si (sub X)Ge (sub 1-x)/Si heterostructures prepared for device fabrication, including structures for heterojunction bipolar transistors (HBT), p-type and n-type heterostructure modulation doped field effect transistors, has been performed. We have shown that SE can simultaneously determine all active layer thicknesses, Si (sub X)Ge (sub 1-x) compositions, and the oxide overlayer thickness, with only a general knowledge of the structure topology needed a priori. The characterization of HBT material included the SE analysis of a Si (sub X)Ge (sub 1-x) layer deeply buried (600 nanometers) under the silicon emitter and cap layers. In the SE analysis of n-type heterostructures, we examined for the first time a silicon layer under tensile strain. We found that an excellent fit can be obtained using optical constants of unstrained silicon to represent the strained silicon conduction layer. We also used SE to measure lateral sample homogeneity, providing quantitative identification of the inhomogeneous layer. Surface overlayers resulting from prior sample processing were also detected and measured quantitatively. These results should allow SE to be used extensively as a non-destructive means of characterizing Si (sub X)Ge (sub 1-x)/Si heterostructures prior to device fabrication and testing. |
| نوع الوثيقة: | Report |
| اللغة: | English |
| DOI: | 10.1063/1.355271 |
| URL الوصول: | https://ntrs.nasa.gov/citations/20150021000 |
| ملاحظات: | Y0T1318 RTOP 506-72-1B |
| رقم الأكسشن: | edsnas.20150021000 |
| قاعدة البيانات: | NASA Technical Reports |
| DOI: | 10.1063/1.355271 |
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