Toxicological Investigations of Waste Products from the Plasma Etching Process in the Semiconductor Industry

التفاصيل البيبلوغرافية
العنوان:	Toxicological Investigations of Waste Products from the Plasma Etching Process in the Semiconductor Industry
المؤلفون:	Bauer, S.^Aff4, Wolff, I.^Aff4, Werner, N.^Aff4, Hoffmann, P.^Aff4, Hillig, R.^Aff5, Voigt, R.^Aff5, Merten, B.^{Aff6, Aff7}, Oemus, K.^Aff4, Rath, F.-W.^Aff4
المساهمون:	Chambers, Philip L., editor^Aff1, Chambers, Claire M., editor^Aff1, Wiezorek, Wolf Diether, editor^Aff2, Golbs, Siegfried, editor^Aff3
المصدر:	Recent Developments in Toxicology: Trends, Methods and Problems : Proceedings of the European Societies of Toxicology Meeting Held in Leipzig, September 12–14, 1990. 14:303-306
قاعدة البيانات:	Springer Nature eBooks

الوصف
ردمك:	9783540514220 9783642749360
DOI:	10.1007/978-3-642-74936-0_65