دورية أكاديمية
Effect of inner oxygen on the interfacial layer formation for HfO2 gate dielectric
| العنوان: | Effect of inner oxygen on the interfacial layer formation for HfO |
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| المؤلفون: | Jiang, RanAff1, IDs108530071584z_cor1, Xie, E. Q., Wang, Z. F. |
| المصدر: | Journal of Materials Science: Full Set - Includes `Journal of Materials Science Letters'. 42(17):7343-7347 |
| قاعدة البيانات: | Springer Nature Journals |
Find this article in full text from Springer Verlag. 
Full Text Finder | تدمد: | 00222461 15734803 |
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| DOI: | 10.1007/s10853-007-1584-z |