دورية أكاديمية

Gate Leakage Suppression and Threshold Voltage Stability Improvement in GaN-Based Enhancement-Mode HEMTs on Ultrathin-Barrier AlGaN/GaN Heterostructures with a p-Doping-Free GaN Cap

التفاصيل البيبلوغرافية
العنوان: Gate Leakage Suppression and Threshold Voltage Stability Improvement in GaN-Based Enhancement-Mode HEMTs on Ultrathin-Barrier AlGaN/GaN Heterostructures with a p-Doping-Free GaN Cap
المؤلفون: Wang, YuhaoAff1, Aff2, Huang, SenAff1, Aff2, IDs1166402411156z_cor2, Jiang, QimengAff1, Aff2, IDs1166402411156z_cor3, Wang, XinhuaAff1, Aff2, Guo, FuqiangAff1, Aff2, Feng, ChaoAff1, Aff2, Fan, JieAff1, Aff2, Yin, HaiboAff1, Aff2, Gao, XinguoAff1, Aff2, Wei, KeAff1, Aff2, Zheng, YingkuiAff1, Aff2, Liu, XinyuAff1, Aff2
المصدر: Journal of Electronic Materials. 53(7):3926-3932
قاعدة البيانات: Springer Nature Journals
الوصف
تدمد:03615235
1543186X
DOI:10.1007/s11664-024-11156-z