دورية أكاديمية
C-V and C-t analysis of buried oxide layers formed by high-dose oxygen implantation
| العنوان: | C-V and C-t analysis of buried oxide layers formed by high-dose oxygen implantation |
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| المؤلفون: | Brady, F. T., Li, S. S., Krull, W. A. |
| المصدر: | Journal of Electronic Materials. May 1989 18(3):385-389 |
| قاعدة البيانات: | Springer Nature Journals |
Find this article in full text from Springer Verlag. 
Full Text Finder | تدمد: | 03615235 1543186X |
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| DOI: | 10.1007/bf02657987 |