دورية أكاديمية
Simulation of silicon etching in NF3 plasma reactor
| العنوان: | Simulation of silicon etching in NF |
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| المؤلفون: | Swami, H LAff1, IDs12043023025790_cor1, Mehta, V, Kumar, Yogendra, Jariwala, Chetan, Kumar, RajeshAff1, Aff2 |
| المصدر: | Pramana: Published by the Indian Academy of Sciences. 97(3) |
| قاعدة البيانات: | Springer Nature Journals |
Find this article in full text from Springer Verlag. 
Full Text Finder | تدمد: | 09737111 |
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| DOI: | 10.1007/s12043-023-02579-0 |