دورية أكاديمية
Selective isotropic etching of SiO2 over Si3N4 using NF3/H2 remote plasma and methanol vapor
| العنوان: | Selective isotropic etching of SiO |
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| المؤلفون: | Gil, Hong Seong, Kim, Doo San, Jang, Yun Jong, Kim, Dea Whan, Kwon, Hea In, Kim, Gyoung Chan, Kim, Dong WooAff1, IDs41598023383594_cor7, Yeom, Geun YoungAff1, Aff2, IDs41598023383594_cor8 |
| المصدر: | Scientific Reports. 13(1) |
| قاعدة البيانات: | Springer Nature Journals |
Find this article in full text from Springer Verlag. 
Full Text Finder | تدمد: | 20452322 |
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| DOI: | 10.1038/s41598-023-38359-4 |