دورية أكاديمية

Raman Shift of Surface Reaction and Plasma Induced Surface Damage by TNF3/BNF3 Reactive Ion Etching Process

التفاصيل البيبلوغرافية
العنوان: Raman Shift of Surface Reaction and Plasma Induced Surface Damage by TNF3/BNF3 Reactive Ion Etching Process
المؤلفون: Shim, Ho Jae, Kim, Jin Seok, Ahn, Da Won, Choe, Jin Hyun, Jung, Eunsu, Oh, Donghyuk, Kim, Kyung Soo, Lee, Sung ChulAff2, IDs1339102200341z_cor8, Pyo, Sung GyuAff1, IDs1339102200341z_cor9
المصدر: Electronic Materials Letters. 18(3):321-329
قاعدة البيانات: Springer Nature Journals
الوصف
تدمد:17388090
20936788
DOI:10.1007/s13391-022-00341-z