دورية أكاديمية

Device Optimization of T-shaped Gate and Polarized Doped Buffer-Engineered InAlN/GaN HEMT for Improved RF/Microwave Performance

التفاصيل البيبلوغرافية
العنوان: Device Optimization of T-shaped Gate and Polarized Doped Buffer-Engineered InAlN/GaN HEMT for Improved RF/Microwave Performance
المؤلفون: Sharma, Megha, Chaujar, RishuAff1, IDs13369024087053_cor2
المصدر: Arabian Journal for Science and Engineering. 49(7):9983-9994
قاعدة البيانات: Springer Nature Journals
الوصف
تدمد:2193567X
21914281
DOI:10.1007/s13369-024-08705-3