دورية أكاديمية

Effects of ratio of hydrogen flow on microstructure of hydrogenated microcrystalline silicon films deposited by magnetron sputtering at 100 °C

التفاصيل البيبلوغرافية
العنوان: Effects of ratio of hydrogen flow on microstructure of hydrogenated microcrystalline silicon films deposited by magnetron sputtering at 100 °C
Alternate Title: 氢稀释比对磁控溅射低温(100 °C)沉积氢化微晶硅薄膜微结构特性的影响
المؤلفون: Wang, Lin-qingAff1, Aff2, Zhou, Yong-taoAff3, Aff4, Wang, Jun-junAff3, Aff4, Liu, Xue-qinAff3, Aff4
المصدر: Journal of Central South University: Science & Technology of Mining and Metallurgy. 26(10):2661-2667
قاعدة البيانات: Springer Nature Journals
الوصف
تدمد:20952899
22275223
DOI:10.1007/s11771-019-4203-7