دورية أكاديمية

Co-sputtering Co–Ti alloy as a single barrier/liner for Co interconnects and thermal stability enhancement using TiN metal capping

التفاصيل البيبلوغرافية
العنوان: Co-sputtering Co–Ti alloy as a single barrier/liner for Co interconnects and thermal stability enhancement using TiN metal capping
المؤلفون: Zhang, DanAff1, Aff2, Xu, Jing, Mao, ShujuanAff1, Aff2, Zhao, ChaoAff1, Aff2, Wang, Guilei, Luo, XueAff1, Aff2, Li, Junfeng, Li, Yongliang, Wang, WenwuAff1, Aff2, Chen, Dapeng, Ye, TianchunAff1, Aff2, Luo, JunAff1, Aff2
المصدر: Journal of Materials Science: Materials in Electronics. 30(11):10579-10588
قاعدة البيانات: Springer Nature Journals
الوصف
تدمد:09574522
1573482X
DOI:10.1007/s10854-019-01402-0