دورية أكاديمية

Study of black silicon obtained by cryogenic plasma etching: approach to achieve the hot spot of a thermoelectric energy harvester

التفاصيل البيبلوغرافية
العنوان: Study of black silicon obtained by cryogenic plasma etching: approach to achieve the hot spot of a thermoelectric energy harvester
المؤلفون: Nguyen, K. N., Abi-Saab, D., Basset, P., Richalot, E., Malak, M., Pavy, N., Flourens, F., Marty, F., Angelescu, D., Leprince-Wang, Y., Bourouina, T.
المصدر: Microsystem Technologies: Micro- and NanosystemsInformation Storage and Processing Systems. November 2012 18(11):1807-1814
قاعدة البيانات: Springer Nature Journals
الوصف
تدمد:09467076
14321858
DOI:10.1007/s00542-012-1486-0