دورية أكاديمية

X-Ray Reflectometry Study of the State of the Surface Layer of Polished Silicon Substrates Depending on the Methods of Their Cleaning

التفاصيل البيبلوغرافية
العنوان: X-Ray Reflectometry Study of the State of the Surface Layer of Polished Silicon Substrates Depending on the Methods of Their Cleaning
المؤلفون: Volkovsky, Yu. A.Aff1, Aff2, Seregin, A. Yu.Aff1, Aff2, Folomeshkin, M. S.Aff1, Aff2, Prosekov, P. A.Aff1, Aff2, Pavlyuk, M. D., Pisarevsky, Yu. V.Aff1, Aff2, Blagov, A. E.Aff1, Aff2, Kovalchuk, M. V.Aff1, Aff2, Aff3
المصدر: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques. 15(5):927-933
قاعدة البيانات: Springer Nature Journals
الوصف
تدمد:10274510
18197094
DOI:10.1134/s1027451021050207